LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks

Hendrik Steigerwald; Runyuan Han; Alexander Buettner; Klaus-Dieter Roeth

doi:10.1117/12.2279676

13 July 2017 LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks

Hendrik Steigerwald, Runyuan Han, Alexander Buettner, Klaus-Dieter Roeth

Proceedings Volume 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology; 104540V (2017) https://doi.org/10.1117/12.2279676
Event: Photomask Japan 2017, 2017, Yokohama, Japan

Abstract

SiN-based absorber materials are considered to be the new work horse for cutting-edge patterning using 193-nm immersion lithography. The high robustness against cleaning procedures and the low susceptibility for haze makes SiN an ideal material for phase-shift masks. Reliable metrology with high precision, on target as well as on feature, is enabled by the LMS IPRO^TM metrology tool. This is achieved by taking into account the optical properties of the novel materials and utilisation of the high-accuracy die-to-database algorithm. Simulation as well as actual measurement results are presented. Cost effectiveness of the LMS IPRO is demonstrated by comparison of high-performance mode results versus high-throughput results, confirming suitable metrology performance for high-volume manufacturing.

Citation Download Citation

Hendrik Steigerwald, Runyuan Han, Alexander Buettner, and Klaus-Dieter Roeth "LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540V (13 July 2017); https://doi.org/10.1117/12.2279676

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