Thickness uniformity study on the ESRF multilayer deposition system

Damien Carau; Jean-Christophe Peffen; Christian Morawe

doi:10.1117/12.2273273

23 August 2017 Thickness uniformity study on the ESRF multilayer deposition system

Damien Carau, Jean-Christophe Peffen, Christian Morawe

Proceedings Volume 10386, Advances in X-Ray/EUV Optics and Components XII; 103860V (2017) https://doi.org/10.1117/12.2273273
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

The ESRF Multilayers Laboratory provides reflective optics in the X-ray domain using a deposition system where silicon substrates are coated with a well-defined multilayers stack. The multilayers period is used to tune the photon energy of the reflected X-ray beam. In some applications, the variation of the thickness profiles of the deposited materials must not exceed 0.1%. The aim of the study is to quantify the thickness uniformity of 1.2 m long single layer coatings with a spatial resolution of 10 mm or better. Results have been analyzed to identify potential sources of thickness variations. Investigations of long multilayers coatings complement this work.

Citation Download Citation

Damien Carau, Jean-Christophe Peffen, and Christian Morawe "Thickness uniformity study on the ESRF multilayer deposition system", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860V (23 August 2017); https://doi.org/10.1117/12.2273273

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