Metrology of semiconductor structures using novel Fabry Perot fringe stretching system

Wojtek J. Walecki; Alexander Pravdivtsev

doi:10.1117/12.2273359

23 August 2017 Metrology of semiconductor structures using novel Fabry Perot fringe stretching system

Wojtek J. Walecki, Alexander Pravdivtsev

Proceedings Volume 10373, Applied Optical Metrology II; 103730N (2017) https://doi.org/10.1117/12.2273359
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

We describe patent pending fiber optic apparatus for measurements of thicknesses and distance employing low resolution spectrometer and etalon. The application of an additional known reference etalon "stretches fringes" and allows us to use Fabry Perot interference to investigate thick samples and large distances which would not be possible when using the low resolution spectrometer alone.

Citation Download Citation

Wojtek J. Walecki and Alexander Pravdivtsev "Metrology of semiconductor structures using novel Fabry Perot fringe stretching system", Proc. SPIE 10373, Applied Optical Metrology II, 103730N (23 August 2017); https://doi.org/10.1117/12.2273359

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