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Self-assembled niobium dioxide (NbO2 ) thin-film selectors self-aligned to tantalum dioxide (TaO2) memristive memory cells are studied by a multi-physics simulation of the mass transport equation coupled to the current continuity equation and heat equation. While a compact circuit model can resolve quasi-static negative differential resistance (NDR), a self-consistent coupled transport formulation provides a non-equilibrium picture of NbO2-TaO2 selector-memristor operation ab initio. By employing the drift-diffusion transport approximation, a finite element method is used to study dynamic electrothermal behavior of our experimentally obtained selector-memristor devices, showing bulk conditions exist favorable for electroformation of NbO2 selector thin-films. Simulation results suggest Poole-Frenkel defects introduce negative differential resistance, in agreement with our measured results.
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