Presentation
21 September 2017 Multi-physics simulation of monolithic tantalum oxide memristor-selector structures illustrating negative differential resistance (Conference Presentation)
John F. Sevic, Nobuhiko Kobayashi
Author Affiliations +
Abstract
Self-assembled niobium dioxide (NbO2 ) thin-film selectors self-aligned to tantalum dioxide (TaO2) memristive memory cells are studied by a multi-physics simulation of the mass transport equation coupled to the current continuity equation and heat equation. While a compact circuit model can resolve quasi-static negative differential resistance (NDR), a self-consistent coupled transport formulation provides a non-equilibrium picture of NbO2-TaO2 selector-memristor operation ab initio. By employing the drift-diffusion transport approximation, a finite element method is used to study dynamic electrothermal behavior of our experimentally obtained selector-memristor devices, showing bulk conditions exist favorable for electroformation of NbO2 selector thin-films. Simulation results suggest Poole-Frenkel defects introduce negative differential resistance, in agreement with our measured results.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John F. Sevic and Nobuhiko Kobayashi "Multi-physics simulation of monolithic tantalum oxide memristor-selector structures illustrating negative differential resistance (Conference Presentation)", Proc. SPIE 10349, Low-Dimensional Materials and Devices 2017, 103490Z (21 September 2017); https://doi.org/10.1117/12.2275219
Advertisement
Advertisement
KEYWORDS
Resistance

Thin films

Finite element methods

Tantalum

Circuit switching

Niobium

Oxides

Back to Top