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1 July 1994 Pareto charts for defect analysis with correlation of inline defects to failed bitmap data
Louis Breaux, Dave Kolar, Robyn Sue Coleman
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Proceedings Volume 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review; 102740I (1994) https://doi.org/10.1117/12.187459
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States
Abstract
Pareto analysis has become one of the most important and widely used tools in solving quality problems. The usefulness of Pareto analysis extends well beyond the application to defect data being applicable to most every department in a company including marketing, production planning, purchasing, sales, maintenance, personnel, accounting, etc. A proper implementation of this tool requires an understanding of the techniques that have been developed and knowing its limitations. In the microelectronics industry processing and analysis of defect data relies heavily on Pareto analysis. With inline defect scanning tools becoming faster and more sensitive, a program to monitor inline defectivity on a regular basis is justified. Correlation of this data with end-of-line electrical failure analysis provides the most accurate Pareto of the most important "killer" defect types.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Louis Breaux, Dave Kolar, and Robyn Sue Coleman "Pareto charts for defect analysis with correlation of inline defects to failed bitmap data", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 102740I (1 July 1994); https://doi.org/10.1117/12.187459
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KEYWORDS
Raster graphics
Failure analysis
Microelectronics
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