Lithography Roadmap: the role of the mask-making industry

Gordon B. McMillan

doi:10.1117/12.177430

1 January 1994 Lithography Roadmap: the role of the mask-making industry

Gordon B. McMillan

Proceedings Volume 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review; 1027302 (1994) https://doi.org/10.1117/12.177430
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

This paper sets a framework for those which follow. Specifically, the requirements of lithography and masks are detailed over a 15 year period and the exposure tool roadmap is reviewed. The various business stages in developing a lithography system, from concept to market success, are discussed and the need for earlier involvement of the mask making industry is identified.

Citation Download Citation

Gordon B. McMillan "Lithography Roadmap: the role of the mask-making industry", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027302 (1 January 1994); https://doi.org/10.1117/12.177430

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