Modern Optical Coating Technologies

Hans K. Pulker

doi:10.1117/12.950029

27 February 1989 Modern Optical Coating Technologies

Hans K. Pulker

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950029
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Highest quality dielectric films are required today for various interference optical applications and for planar wave guides in integrated optics. Many inorganic chemical compounds which were difficult to deposit by conventional techniques in form of well adherent, dense, hard and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating materials atom processes. A survey over such PVD coating technologies and on the resulting film properties is given in this paper.

Citation Download Citation

Hans K. Pulker "Modern Optical Coating Technologies", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950029

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available