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As a promising candidate for the next generation of infrared detection and imaging, more and more studies are focused on the type-II InAs/GaSb superlattice recently. In this paper, we studied different passivation techniques and the dielectric film-semiconductor interface properties for InAs/GaSb superlattice photodetectors. We found that with Si3N4 passivation, the R0A of the superlattice detector decreased from 2.8×105Ωcm2 to 12Ωcm2 at 80K after a process of rapid thermal annealing (RTA) at 250°C for 60s. Excessive surface charge of 6.15×1012cm-2 was measured from a gate-controlled structure. Meanwhile, the SiO2 passivated devices can sustain its electrical performance after the RTA process.
Yurong Cui,Jianxin Chen,Zhicheng Xu,Jiajia Xu,Yi Zhou, andLi He
"Studies on different passivation on InAs/GaSb type-II superlattice photodetectors", Proc. SPIE 10157, Infrared Technology and Applications, and Robot Sensing and Advanced Control, 101573K (1 November 2016); https://doi.org/10.1117/12.2247485
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Yurong Cui, Jianxin Chen, Zhicheng Xu, Jiajia Xu, Yi Zhou, Li He, "Studies on different passivation on InAs/GaSb type-II superlattice photodetectors," Proc. SPIE 10157, Infrared Technology and Applications, and Robot Sensing and Advanced Control, 101573K (1 November 2016); https://doi.org/10.1117/12.2247485