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19 October 2016 Measurement accuracy analysis for crystal plane spacing of nitride epitaxial layer by x-ray diffraction
Jianjun Cui, Sitian Gao
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Proceedings Volume 10155, Optical Measurement Technology and Instrumentation; 101553P (2016) https://doi.org/10.1117/12.2247433
Event: International Symposium on Optoelectronic Technology and Application 2016, 2016, Beijing, China
Abstract
In order to realize high accuracy measurement of the physical dimension of unit cells in a crystal lattice, the measurement accuracy analysis for crystal plane spacing of nitride epitaxial layer is discussed. An angular analysis for X-ray diffractometer system is established and the measurement uncertainty from the experimental apparatus, measurement method are also analyzed. Experimental results indicate that the accuracy of the system’s angular can get U = ±0.01° (k=2) and the measuring accuracy of lattice plane spacing is within 0.01% of the d-spacing. These results represent an improvement in the existing measurement capabilities by more than an order of magnitude and make more numerous systematic effects visible and reproducible.
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Jianjun Cui and Sitian Gao "Measurement accuracy analysis for crystal plane spacing of nitride epitaxial layer by x-ray diffraction", Proc. SPIE 10155, Optical Measurement Technology and Instrumentation, 101553P (19 October 2016); https://doi.org/10.1117/12.2247433
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KEYWORDS
Crystals
Metrology
X-ray diffraction
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