Image acquisition and motion positioning system design based on the projection lens wavefront aberration measurement

Xiaoquan Han; Bing Li; Yuejing Qi; Guangyi Liu

doi:10.1117/12.2257455

24 March 2017 Image acquisition and motion positioning system design based on the projection lens wavefront aberration measurement

Xiaoquan Han, Bing Li, Yuejing Qi, Guangyi Liu

Author Affiliations +

Proceedings Volume 10147, Optical Microlithography XXX; 1014720 (2017) https://doi.org/10.1117/12.2257455
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Projection lens is an important part of the lithography. The wave aberration is the key index, which directly affects the critical dimension. The main methods of wavefront aberration detection are shear interferometry, Shack- Hartmann diffraction interferometry method and point diffraction interferometry. One shearing interference method can realize the nanometer precision. This method needs high precise motion positioning and high signal-to-noise ratio of image acquisition system. a kind of image acquisition and motor positioning control system based on shear interference was designed and realized the high precision motion position of shear grating and shearing interference fringes of synchronization acquisition. a method of improving the shearing interference image imaging quality was proposed to improve the detection precision of the wave aberration, the simulation and experiment show that wave aberration precision can reach 10 nm; At the same time, through optimizing software algorithm, greatly improve the detection time and work efficiency.

Citation Download Citation

Xiaoquan Han, Bing Li, Yuejing Qi, and Guangyi Liu "Image acquisition and motion positioning system design based on the projection lens wavefront aberration measurement ", Proc. SPIE 10147, Optical Microlithography XXX, 1014720 (24 March 2017); https://doi.org/10.1117/12.2257455

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