Use Of Carbonized Photoresist For Optical Mask Repair

Michael S. Hibbs; Burn J. Lin; Yuli Vladimirsky

doi:10.1117/12.968399

1 January 1988 Use Of Carbonized Photoresist For Optical Mask Repair

Michael S. Hibbs, Burn J. Lin, Yuli Vladimirsky

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968399
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Carbonized novolac photoresist has been demonstrated as a patching material for clear defects in optical masks. The processing is simple and uses commonly available equipment. The patches, though not as tough as chrome, adhere well and survive mask cleaning. Mask materials appear to survive heating up to 1000°C, but distortion testing has only been done up to 500°C. Adhesion of the carbonized resist begins to degrade above 700°C processing temperature.

Citation Download Citation

Michael S. Hibbs, Burn J. Lin, and Yuli Vladimirsky "Use Of Carbonized Photoresist For Optical Mask Repair", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968399

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