Excimer Laser Photolithography With 1:1 Wynne-Dyson Optics

F. N. Goodall; R. A. Lawes

doi:10.1117/12.968439

1 January 1988 Excimer Laser Photolithography With 1:1 Wynne-Dyson Optics

F. N. Goodall, R. A. Lawes

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968439
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Excimer laser lithography will extend optical techniques to deep-uv wavelengths and enable linewidths at 0.5μm or below to be printed routinely. The main problems concern the development of suitable lenses, resist technology and alignment systems. This paper addresses mainly the first problem, from the viewpoint of 1:1 Wynne-Dyson optics. Two lenses are discussed, one operating at λ = 249nm and the other at λ = 193nm which is currently undergoing evaluation.

Citation Download Citation

F. N. Goodall and R. A. Lawes "Excimer Laser Photolithography With 1:1 Wynne-Dyson Optics", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968439

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