An Electrical Test Structure For Routine 10Nm Reticle Overlay.

C. M. Cork; E. G. Dobson

doi:10.1117/12.968390

1 January 1988 An Electrical Test Structure For Routine 10nm Reticle Overlay.

C. M. Cork, E. G. Dobson

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968390
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

This paper discusses INMOS UK's incoming Q.A. procedure for reticle overlay. The technique is based on an electrical differential linewidth test structure, known as a Three Leg Stickman, for measuring misalignment. This structure Is placed at four symmetric positions outside of the datafield of a reticle. When printed on test wafers it allows misalignments to be measured to a repeatabilty of 10nm and an accuracy of better than 20nm across a 20mm printed reticle frame. The paper discusses how the structure was optimised and shows that ±5ppm reticle overlay can be achieved with reticles written on a Varian VLS-40 E-beam system on Borosilicate glass. The technique also provides a variety of other information on stepper performance and has been used as part of an evaluation of the accuracy of commercial optical metrology systems.

Citation Download Citation

C. M. Cork and E. G. Dobson "An Electrical Test Structure For Routine 10nm Reticle Overlay.", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968390

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