Ion-Assisted Deposition Of Lanthanide Trifluorides For VUV Applications

L. J. Lingg; J. D. Targove; J. P. Lehan; H. A. Macleod

doi:10.1117/12.967478

1 January 1987 Ion-Assisted Deposition Of Lanthanide Trifluorides For VUV Applications

L. J. Lingg, J. D. Targove, J. P. Lehan, H. A. Macleod

Proceedings Volume 0818, Current Developments in Optical Engineering II; (1987) https://doi.org/10.1117/12.967478
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

The lanthanide trifluorides show promise as vacuum ultraviolet (VUV) coating materials. The optical properties of single-layer coatings vary with deposition temperature, and with ion-beam energy and current density. The optical constants, stoichiometry, durability, moisture adsorption, and crystallinity are studied for trifluoride films made under a variety of deposition conditions.

Citation Download Citation

L. J. Lingg, J. D. Targove, J. P. Lehan, and H. A. Macleod "Ion-Assisted Deposition Of Lanthanide Trifluorides For VUV Applications", Proc. SPIE 0818, Current Developments in Optical Engineering II, (1 January 1987); https://doi.org/10.1117/12.967478

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