Sub-Micron Lithography Characterization Using An Expert System

M. W. Cresswell; N. Pessall; R. J. Betsch; L. W. Linholm; D. J. Radack

doi:10.1117/12.940439

17 April 1987 Sub-Micron Lithography Characterization Using An Expert System

M. W. Cresswell, N. Pessall, R. J. Betsch, L. W. Linholm, D. J. Radack

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940439
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

This paper describes a test chip, test results, rule generation techniques, and an expert system for characterizing the performance of a sub-micron lithography process. Examples of test results, data reduction techniques, and expert system output are given. The objective of this work is to develop a system for automatic process diagnosis.

Citation Download Citation

M. W. Cresswell, N. Pessall, R. J. Betsch, L. W. Linholm, and D. J. Radack "Sub-Micron Lithography Characterization Using An Expert System", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940439

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