High Temperature Photonegative Resists Based On Styrylpyridinium Units

MinYu Li; Eli M. Pearce; S. Narang

doi:10.1117/12.940307

25 August 1987 High Temperature Photonegative Resists Based On Styrylpyridinium Units

MinYu Li, Eli M. Pearce, S. Narang

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940307
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Four types of condensation linear polymers containing styrylpyridine units were prepared as high temperature stable photoresists: polyester and polyurethane derived from 2,6-bis(p-hydroxystyryl) pyridine, and polyamide and polyimide derived from 2,6-bis(paminostyryl)py-ridine or 2,6-bis(p-carboxystyryl)pyridine. The polymers are thermally stable in the temperature range between 360 to 500°C except for the polyurethane. The decomposition temperature is higher for the aromatic polymers, lower for their aliphatic analogs. The polymers are photoreactive and crosslink based on the 2+2 cycloaddition mechanism under UV irradiation. The highest photosensitivity of these polymers, as measured by gel dose, is in the region of 10-40 mJ/cm2. The quantum yield of the photoreaction and the relationship of the photosensitivity with the morphology in the polymer systems were studied.

Citation Download Citation

MinYu Li, Eli M. Pearce, and S. Narang "High Temperature Photonegative Resists Based On Styrylpyridinium Units", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); https://doi.org/10.1117/12.940307

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