Fabrication Of X-Ray Optical Elements By Electron Beam Lithography

Hiroaki Aritome; Susumu Namba

doi:10.1117/12.964944

1 January 1986 Fabrication Of X-Ray Optical Elements By Electron Beam Lithography

Hiroaki Aritome, Susumu Namba

Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964944
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany

Abstract

Electron beam lithography is an efficent method for fabricating x-ray zone plates. In this report, fabrication of x-ray zone plates by electron beam lithography whose applications are for an x-ray microscope and an x-ray linear monochromator at the undulator radiation line (fundamental wavelengths:1.3-3.0 nm) of the Photon Factory in Tsukuba. Experiments using synchrotron radiation to characterize fabricated zone plates are described. It is also shown that it is feasible to fabricate x-ray zone plates with spatial resolution of 20 nm by electron beam lithography.

Citation Download Citation

Hiroaki Aritome and Susumu Namba "Fabrication Of X-Ray Optical Elements By Electron Beam Lithography", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964944

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