Variable Pressure Ion Chamber For Relative And Absolute Flux Measurement

B. X. Yang; J. Kirz; I. McNulty

doi:10.1117/12.936561

12 August 1986 Variable Pressure Ion Chamber For Relative And Absolute Flux Measurement

B. X. Yang, J. Kirz, I. McNulty

Proceedings Volume 0689, X-Ray Calibration: Techniques, Sources, and Detectors; (1986) https://doi.org/10.1117/12.936561
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

When an X-ray beam is not monochromatic, the transmitted flux through an absorber is not an exponential function of the absorber thickness. Instead, it may be a sum of two, three, or more exponential functions depending on whether the beam contains photons of two, three, or more different energies. This work shows that if the thickness of a gaseous absorber is continuously varied by adjusting the gas pressure, the relative strength of different harmonics in the monochromator output can be determined. This method also provides an accurate means to measure the absolute cross section of the gas molecules, and in conjunction with a modified Samson type ion chamber may also be used to measure the absolute photon flux as well.

Citation Download Citation

B. X. Yang, J. Kirz, and I. McNulty "Variable Pressure Ion Chamber For Relative And Absolute Flux Measurement", Proc. SPIE 0689, X-Ray Calibration: Techniques, Sources, and Detectors, (12 August 1986); https://doi.org/10.1117/12.936561

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