Antireflective Coating Material For Highly Reflective Surfaces With Topography

W. Ishii; K. Hashimoto; N. Itoh; H. Yamazaki; A. Yokota; H. Nakane

doi:10.1117/12.963654

9 July 1986 Antireflective Coating Material For Highly Reflective Surfaces With Topography

W. Ishii, K. Hashimoto, N. Itoh, H. Yamazaki, A. Yokota, H. Nakane

Proceedings Volume 0631, Advances in Resist Technology and Processing III; (1986) https://doi.org/10.1117/12.963654
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

We have developed an undercoating material, SWK 436( Standing Wave Killer 436 ), that is composed of a polymer synthesized from the compounds that mainly consist of triazine derivatives and physically mixed dyes. It has an antireflective effect and no photoreactive property. Its maximum absorption is at about 450nm but it is designed to have a high degree of efficiency to absorb light at 436nm wave length. When SWK was applied to a bilayer resist system on an aluminum substrate, stsnding wave generation was quenched as it absorbed reflected or scattered light. The variation of resist pattern dimension was got to be lower. The resolution of resist pattern with SWK was resulted higher than the resolution without SWK on an aluminum substrate.

Citation Download Citation

W. Ishii, K. Hashimoto, N. Itoh, H. Yamazaki, A. Yokota, and H. Nakane "Antireflective Coating Material For Highly Reflective Surfaces With Topography", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963654

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