Laser Repair Of Transparent Microfaults In IC Photomasks

Hp. Preiswerk; C. C. Sheu; S. D. Allen

doi:10.1117/12.961148

5 August 1986 Laser Repair Of Transparent Microfaults In IC Photomasks

Hp. Preiswerk, C. C. Sheu, S. D. Allen

Proceedings Volume 0621, Manufacturing Applications of Lasers; (1986) https://doi.org/10.1117/12.961148
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States

Abstract

A laser direct writing method based on the pyrolysis of a thin solid state organometallic film for repairing transparent defects in pholomasks has been developed. The film is applied using standard photoresist spin-coating techniques and a focused Ar laser beam is used to locally decompose the metallo organic coating. This technique is capable of generating submicron opaque metallic features under ambient atmosphere conditions. Experimental results as well as limitinp factors are discussed.

Citation Download Citation

Hp. Preiswerk, C. C. Sheu, and S. D. Allen "Laser Repair Of Transparent Microfaults In IC Photomasks", Proc. SPIE 0621, Manufacturing Applications of Lasers, (5 August 1986); https://doi.org/10.1117/12.961148

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