Initial Operation Of A New High-Resolution Scanning Ion Microscope

R Levi-Setti; P H La Marche; K Lam; Y L. Wang

doi:10.1117/12.942327

18 June 1984 Initial Operation Of A New High-Resolution Scanning Ion Microscope

R Levi-Setti, P H La Marche, K Lam, Y L. Wang

Proceedings Volume 0471, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III; (1984) https://doi.org/10.1117/12.942327
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

We describe the initial performance of the optical column and imaging instrumentation of a second-generation scanning ion microscope/microprobe. The instrument operates in the 20- 60 kV range and makes use of a Ga liquid metal ion source. High-quality secondary electron and ion images of conductors and insulators have been thus far obtained at 90 nm measured spot size. Ultimately the instrument is expected to perform secondary ion mass spectrometry, imaging, and microlithography functions in the 10 - 100 nm range of spot sizes.

Citation Download Citation

R Levi-Setti, P H La Marche, K Lam, and Y L. Wang "Initial Operation Of A New High-Resolution Scanning Ion Microscope", Proc. SPIE 0471, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, (18 June 1984); https://doi.org/10.1117/12.942327

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available