Overlay Performance Of The Perkin-Elmer Model 500

C. P. Ausschnitt; T. A. Brunner; D. J. Cronin

doi:10.1117/12.935123

7 November 1983 Overlay Performance Of The Perkin-Elmer Model 500

C. P. Ausschnitt, T. A. Brunner, D. J. Cronin

Proceedings Volume 0394, Optical Microlithography II: Technology for the 1980s; (1983) https://doi.org/10.1117/12.935123
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

We describe the procedures and results of overlay performance evaluation conducted on production Micralign Series Model 500s. Studies of machine-to-contact print and machine-to-machine overlay, stability, and automatic alignment are presented. Preliminary results on automatic alignment indicate that the 98% limit of total overlay error - alignment plus distortion - can be kept below 0.3 μm.

Citation Download Citation

C. P. Ausschnitt, T. A. Brunner, and D. J. Cronin "Overlay Performance Of The Perkin-Elmer Model 500", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); https://doi.org/10.1117/12.935123

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