Normal Incidence Spectrophotometer Film Thickness Measurement Tool

S. A. Manning

doi:10.1117/12.934107

23 May 1983 Normal Incidence Spectrophotometer Film Thickness Measurement Tool

S. A. Manning

Proceedings Volume 0360, Robotics and Industrial Inspection; (1983) https://doi.org/10.1117/12.934107
Event: 26th Annual Technical Symposium, 1982, San Diego, United States

Abstract

The Normal Incidence Spectrophotometer (NIS) Measurement Tool is used to automatically measure the thickness of transparent films on silicon wafers. Under the control of an IBM. System 7 computer, both, wafer handling and the thickness measurement are performed. automatically. Wafers are transported through the tool on a covered airtrack, and after posi-tioning in a vacuum, chuck, are moved under the measurement head to pre-programmed measurement sites. Reflectivity data from the wafer surface, as a function of wavelength, is used by a software algorithm to calculate film, thickness. This tool is used on advanced manufacturing lines at IBM in both. East Fishkill, N.Y. and Burlington, Vt.

Citation Download Citation

S. A. Manning "Normal Incidence Spectrophotometer Film Thickness Measurement Tool", Proc. SPIE 0360, Robotics and Industrial Inspection, (23 May 1983); https://doi.org/10.1117/12.934107

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