Microdensitometer Measurements Of Photomask Quality

David Kryger

doi:10.1117/12.958587

28 May 1980 Microdensitometer Measurements Of Photomask Quality

David Kryger

Proceedings Volume 0220, Optics in Metrology and Quality Assurance; (1980) https://doi.org/10.1117/12.958587
Event: 1980 Los Angeles Technical Symposium, 1980, Los Angeles, United States

Abstract

The need for fast, objective, and accurate measurement of several aspects of photomasks is clear. Photomask technology, on a production basis, is rapidly approaching the 1 pm geometries. In doing so, current automated inspection equipment becomes of limited usefulness. The following is a discussion of measurements made using a microdensitometer. These measurements are intended to show that the basis for an instrument that is capable of increasing high resolution measurements does exist.

Citation Download Citation

David Kryger "Microdensitometer Measurements Of Photomask Quality", Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); https://doi.org/10.1117/12.958587

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