Paper
1 March 1974 Photomask Terminology
Phillip A. Schultz, Dino R. Ciarlo
Author Affiliations +
Abstract
Standardization of terminology in the IC photomask industry needs to be accomplished in the near future. Some of the difficulties usually encountered when attempting standardization, as well as suggestions on how to approach standardization are discussed. Over 125 repre-sentative IC photomask terms have been selected, categorized, and defined.
© (1974) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Phillip A. Schultz and Dino R. Ciarlo "Photomask Terminology", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954243
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KEYWORDS
Photomasks

Coating

Opacity

Diffraction

Inspection

Photoresist materials

Standards development

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