Advances In Photoresist Application

Pete Atwell

doi:10.1117/12.954241

1 March 1974 Advances In Photoresist Application

Pete Atwell

Proceedings Volume 0055, Technological Advances in Micro and Submicro Photofabrication Imagery; (1974) https://doi.org/10.1117/12.954241
Event: Acquisition and Analysis of Pictorial Data, 1974, San Diego, United States

Abstract

The continued pressure for increased function complexity and more functions per package has led the semiconductor industry into a new generation of processing technology. The success of these complex functions in the marketplace (calculators, watches, home enter-tainment, etc.) has accelerated the need for very high volume imple-mentation of these process developments. Therefore, the semiconductor manufacturer has entered a new era of extremely precise process control coupled with a need for programming each process to the optimum yield performance. In addition to these quality measures, modern semi-conductor economics require practi-cal cost effective automation. This paper will cover the problems as-sociated with process optimization and automation of the photoresist facility. It will disclose the results of a survey of what industry needs in equipment to best attain the conditions. After the results are covered, you will be presented with Cobilt's answers to those needs.

Citation Download Citation

Pete Atwell "Advances In Photoresist Application", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954241

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KEYWORDS

Semiconducting wafers

Photoresist materials

Photomasks

Reliability

Semiconductors

Thin film coatings

Optical alignment

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