Presentation
4 October 2023 Fabrication of high aspect ratio structures for meta-surface optics
Author Affiliations +
Abstract
Fabrication of structures with high aspect ratios (HAR) enables creation of metasurface optics with ever-increasing functionality. Dielectric meta-atoms consist of transverse (x,y) shapes extruded in the z-dimension. The phase discontinuity imparted by the meta-atom is a function of the dielectric constant of the material and the z-height of the meta-atom. The performance of the meta-optic improves with larger phase swings. Here we demonstrate HAR etched structures in silicon and gallium arsenide. Initial etch development employs interferometric lithography while final patterns are realized using e-beam patterning. The paper will discuss this etch development process for both material sets.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Bruce Burckel, Katherine M. Musick, Travis R. Young, Loren Gastian, and John Mudrick "Fabrication of high aspect ratio structures for meta-surface optics", Proc. SPIE PC12646, Metamaterials, Metadevices, and Metasystems 2023, PC126460T (4 October 2023); https://doi.org/10.1117/12.2678379
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KEYWORDS
Fabrication

Defense and security

Dielectrics

Electron beam lithography

Etching

Lithography

Materials processing

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