Presentation
2 December 2022 Identifying, understanding, and suppressing of ns laser damage precursors in dielectric thin films
Author Affiliations +
Abstract
We will present our recent advances in identifying, understanding, and suppressing ns laser damage precursors in IBS produced dielectric films under UV, pulsed laser exposure. Model systems of single layer, layer pairs, and MLD coatings of silica, hafnia, scandia, and alumina were investigated. Through materials characterization, laser damage testing and simulations, we revealed that entrapped nanobubbles were important low fluence laser damage precursors. We further demonstrated that the identified precursors could be suppressed by either post low pressure thermal annealing or the manipulation of deposition process including using different sputtering gases to achieve ns UV-laser damage resistant dielectric coatings.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Roger Qiu, Colin Harthcock, Raluca Negres, Chris Stolz, Gabe Guss, Vanessa Peters, Paul Mirkarimi, Eyal Feigenbaum, Thomas Voisin, Josh Hammons, Chris Colla, Harris Mason, and Mengbing Huang "Identifying, understanding, and suppressing of ns laser damage precursors in dielectric thin films", Proc. SPIE PC12300, Laser-Induced Damage in Optical Materials 2022, PC123000P (2 December 2022); https://doi.org/10.1117/12.2642498
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KEYWORDS
Laser induced damage

Dielectrics

Thin films

Optical coatings

Monte Carlo methods

Pulsed laser operation

Sputter deposition

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