Eric R. Poortinga
Product Manager and Sales Representative
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882V (2009) https://doi.org/10.1117/12.835948
KEYWORDS: Photomasks, Image analysis, Image processing, Semiconducting wafers, Error analysis, Manufacturing, Analytical research, Tolerancing, Critical dimension metrology, Standards development

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792D (2009) https://doi.org/10.1117/12.824327
KEYWORDS: Photomasks, Image analysis, Metrology, Semiconducting wafers, Manufacturing, Error analysis, Analytical research, Critical dimension metrology, Standards development, Lithography

Proceedings Article | 1 November 2007 Paper
Proceedings Volume 6730, 67304H (2007) https://doi.org/10.1117/12.746988
KEYWORDS: Metrology, Photomasks, Computer programming, Manufacturing, Interfaces, Manufacturing equipment, Databases, Visualization, Optical proximity correction, Data modeling

Proceedings Article | 25 May 2007 Paper
Grant Davis, Sun Young Choi, Eui Hee Jung, Arne Seyfarth, Hans van Doornmalen, Eric Poortinga
Proceedings Volume 6607, 66072A (2007) https://doi.org/10.1117/12.728993
KEYWORDS: Photomasks, Image processing, Critical dimension metrology, Semiconducting wafers, Metrology, Design for manufacturing, Visualization, Lithography, Scanning electron microscopy, Interfaces

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 653307 (2007) https://doi.org/10.1117/12.736325
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Metrology, Lithography, Data acquisition, Manufacturing, Photoresist processing, Image acquisition

Showing 5 of 13 publications
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