Flexible sparse and dense OPC algorithms

Nick Cobb

doi:10.1117/12.617198

28 June 2005 Flexible sparse and dense OPC algorithms

Nick Cobb

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617198
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

In this paper, we distinguish between sparse and dense simulation. We give a background on known sparse and dense simulation techniques. We propose a new “semi-dense” OPC technique which is between standard sparse, and fully dense OPC. We also discuss a fully dense OPC algorithm, in which full image grids are used to control the OPC corrections. Finally, we discuss dense verification to ensure good printing behavior through process window on the full image.

Citation Download Citation

Nick Cobb "Flexible sparse and dense OPC algorithms", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617198

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