System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

Koen van Ingen Schenau; Hans Bakker; Mark Zellenrath; Richard Moerman; Jeroen Linders; Thomas Rohe; Wolfgang Emer

doi:10.1117/12.474612

30 July 2002 System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

Koen van Ingen Schenau, Hans Bakker, Mark Zellenrath, Richard Moerman, Jeroen Linders, Thomas Rohe, Wolfgang Emer

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474612
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

This paper shows the improvements in imaging performance on the ASML PAS5500/800^TM, the PAS5500/850B^TM and the TWINSCAN^TM AT:850B^TM Step & Scan systems. During setup, the lens aberrations are measured by the TAMIS technique and optimized. This gives excellent imaging performance for aberration sensitive features such as 'two bar,' the DRAM isolation pattern and isolated lines printed with alternating PSM. Lithographic tests based on these features were developed and tested on a number of 800 and 850 systems and gave results well within specification limits. Consequently, the imaging performance has been improved for a wide range of applications.

Citation Download Citation

Koen van Ingen Schenau, Hans Bakker, Mark Zellenrath, Richard Moerman, Jeroen Linders, Thomas Rohe, and Wolfgang Emer "System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474612

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