Quantum scale structures of nanocrystalline silicon films

Hongyi Lin; Yan Na Gao; Bo Liao; Yingzi Guo; Jinghua Liu; Ying Xue Li

doi:10.1117/12.369434

9 November 1999 Quantum scale structures of nanocrystalline silicon films

Hongyi Lin, Yan Na Gao, Bo Liao, Yingzi Guo, Jinghua Liu, Ying Xue Li

Proceedings Volume 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures; (1999) https://doi.org/10.1117/12.369434
Event: International Symposium on Photonics and Applications, 1999, Singapore, Singapore

Abstract

Based on the growth process analysis of nanocrystalline silicon films, a fractal growth model named diffusion and reaction limited aggregation (DRLA) model is proposed, which is different from diffusion limited aggregation model. Nanocrystalline silicon films with quantum scale structures were prepared by PECVD method. Computer simulation of the DRLA model has been done, the results are in agreement with the experimental results. The relationship between structure of nanocrystalline silicon film and aggregation of nanocrystalline silicon film has also been discussed.

Citation Download Citation

Hongyi Lin, Yan Na Gao, Bo Liao, Yingzi Guo, Jinghua Liu, and Ying Xue Li "Quantum scale structures of nanocrystalline silicon films", Proc. SPIE 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures, (9 November 1999); https://doi.org/10.1117/12.369434

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