Detection of reagent residue on unpolished wafer surface using spot scanning surface inspection system

Dingjun Qu; Zhiwei Li; Zuoda Zhou; Ruizhe Ding; Wei Jin; Haiyan Luo; Wei Xiong

doi:10.1117/12.2654751

15 December 2022 Detection of reagent residue on unpolished wafer surface using spot scanning surface inspection system

Dingjun Qu, Zhiwei Li, Zuoda Zhou, Ruizhe Ding, Wei Jin, Haiyan Luo, Wei Xiong

Proceedings Volume 12478, Thirteenth International Conference on Information Optics and Photonics (CIOP 2022); 124782F (2022) https://doi.org/10.1117/12.2654751
Event: Thirteenth International Conference on Information Optics and Photonics (CIOP 2022), 2022, Xi'an, China

Abstract

The reagent residue on the unpolished wafer surface will hinder the performance of semiconductor materials. Due to the limited sensitivity and dynamic range of conventional optical detection systems, the residue defects are difficult to detect. A multi-channel spot scanning defect inspection system (SSDIS) is applied to detect the macro reagent residue defects on unpolished wafer. The experiment illustrates that the reflective channel detector is more sensitive to the reagent residue defect. Because of surface roughness of unpolished wafers, the macro reflected defect signal detected by SSDIS always has a low signal-to-noise ratio (SNR) and is hard to analyze. A simple and effective residue defect detection method based on discrete cosine transform (DCT) with OTSU is proposed and implemented. The experimental results showed that the reagent residue with low SNR can be detected accurately.

Citation Download Citation

Dingjun Qu, Zhiwei Li, Zuoda Zhou, Ruizhe Ding, Wei Jin, Haiyan Luo, and Wei Xiong "Detection of reagent residue on unpolished wafer surface using spot scanning surface inspection system", Proc. SPIE 12478, Thirteenth International Conference on Information Optics and Photonics (CIOP 2022), 124782F (15 December 2022); https://doi.org/10.1117/12.2654751

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