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Edge-dependent interpolation-based deinterlacing using edge patterns

[+] Author Affiliations
Min Kyu Park

Yonsei University, Department of Electrical and Electronic Engineering, 134 Shinchon, Seodaemun-Ku, Seoul, Korea 120-749

Min Byun

Samsung Electronics Company, Maetan-3 dong, Paldal-gu, Suwon-si, Gyeonggi-do, Korea 443-742

Jong Hyun Park

Yonsei University, Department of Electrical and Electronic Engineering, 134 Shinchon, Seodaemun-Ku, Seoul, Korea 120-749

Moon Gi Kang

Yonsei University, Department of Electrical and Electronic Engineering, 134 Shinchon, Seodaemun-Ku, Seoul, Korea 120-749

J. Electron. Imaging. 15(4), 043003 (October 24, 2006). doi:10.1117/1.2360696
History: Received December 29, 2005; Revised April 02, 2006; Accepted July 31, 2006; Published October 24, 2006
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A deinterlacing algorithm based on edge-dependent interpolation (EDI) that considers edge patterns is proposed. Generally, EDI algorithms perform visually better than other deinterlacing algorithms using one field. However, they produce unpleasant results due to failure in estimating edge direction. To estimate the edge direction precisely, not only simple differences between adjacent two lines but also edge patterns are used. Edge patterns, which give sufficient information to estimate the edge direction, appear along the edge direction. Therefore, we analyze properties of edge patterns and model them as a weight function. The weight function helps the proposed method to estimate the edge direction precisely. Experimental results indicate that the proposed algorithm outperforms conventional EDI approaches with respect to both objective and subjective criteria.

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© 2006 SPIE and IS&T

Topics

Algorithms

Citation

Min Kyu Park ; Min Byun ; Jong Hyun Park and Moon Gi Kang
"Edge-dependent interpolation-based deinterlacing using edge patterns", J. Electron. Imaging. 15(4), 043003 (October 24, 2006). ; http://dx.doi.org/10.1117/1.2360696


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