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Oblique lattice systems and its application to design halftone masks

[+] Author Affiliations
Kanya Ishizaka

Fuji Xerox Co., Ltd., 430 Sakai, Nakai-Machi, Ashigarakami-gun Kanagawa 259-0157, Japan

J. Electron. Imaging. 14(3), 033002 (July 22, 2005). doi:10.1117/1.1990109
History: Received July 07, 2004; Revised February 27, 2005; Accepted March 02, 2005; Published July 22, 2005; Online July 22, 2005
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An oblique lattice system (OLS) is defined by two groups of parallel lines in a rectangle, and some properties of the system are mentioned. From the property of OLS that are constrained to rectangle sizes, it is shown that the system provides good mathematical treatments of lattices. Next, a simple algorithm to design integral lattice-based halftone masks by the OLS is introduced. In the algorithm, the “uniform balanced numbering” concept for general halftone masks is decomposed into a simple “local and global numberings” concept for integral lattice-based masks. The OLS is used to realize the local and global numberings concept and to know conditions of halftone masks to design. As a result, we can easily achieve halftone masks based on oblique lattices that realize the required conditions (mask size, resolution, line angle, etc.) and good image quality.

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© 2005 SPIE and IS&T

Topics

Halftones

Citation

Kanya Ishizaka
"Oblique lattice systems and its application to design halftone masks", J. Electron. Imaging. 14(3), 033002 (July 22, 2005). ; http://dx.doi.org/10.1117/1.1990109


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